Semiconductor Grade 3000℃ Maximum Temperature Graphitization Furnace with High-Efficiency Filtration System

Semiconductor Carbon Nanotube Purification High Temperature Vacuum Graphitization Furnace with Chemical Treatment

JTG-SC3000 semiconductor-grade carbon nanotube purification furnace combines high-temperature graphitization with chemical purification methods. Engineered for new energy vehicles, semiconductor, and advanced materials industries requiring ultra-high purity carbon nanotube materials.

Key Features

• Combined high-temperature and chemical purification method for maximum purity
• 3000℃ working temperature for complete carbon nanotube graphitization
• High-efficiency filtration system for contaminant removal during processing
• ±5℃ temperature uniformity across the entire processing chamber
• SS 304 construction with corrosion-resistant internal coating

Applications

Designed for semiconductor industry carbon nanotube purification, new energy vehicle battery materials, and advanced electronic component manufacturing.

Technical Advantages

• Dual purification method achieves purity levels exceeding industry standards
• High-efficiency filtration captures metallic contaminants during processing
• Temperature uniformity ensures consistent CNT quality across large batches
• Corrosion-resistant design for long service life in chemical processing environments

After-Sales Service

1 year comprehensive warranty with remote technical support. On-site installation and training available. Spare parts supplied within 7 working days. Lifetime technical consultation included.