CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film

Product Details

Brand Name: Jingtan

Certification: CE

Payment & Shipping Terms

Minimum Order Quantity: 1 set

Price: USD12,000-100,000/SET

Packaging Details: wooden case packing

Delivery Time: 60 days

Payment Terms: L/C/T/T

Supply Ability: 30 Piece/Pieces per Quarter

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Specifications

Description

Specifications

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                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                              Deposition Equipment For Semiconductor Material, CVD Furnace For Semiconductor Material
                                                  

Place Of Origin:	Hunan, China	Type:	Induction Furnace
Usage:	Deposition Furnace	Video Outgoing-inspection:	Provided
Machinery Test Report:	Provided	Core Components:	PLC
Brand Name:	Jingtan	Voltage:	380
Weight (t):	2 T	Power (kw):	220
Key Selling Points:	Competitive Price	Design Temperature (℃):	1250-2200
Woring Temperature:	900-1200℃	Pressure Rise Rate (Pa/h):	0.67Pa/h(150Pa/24h)
Heating Method:	Resistance/induction	Working Atmosphere:	Vacuum/CH4/C3H6/H2/N2/Ar
Furnace Type:	Square/roundVertical/Horizontal	Furnace Cooling Mode:	Furnace Shell Water Cooling
Infrared Instrument:	Single/double Colorimetric	Temperature Uniformity:	±5
Limit Vacuum Degree(Pa):	1-100	Marketing Type:	Ordinary Product
Warranty Of Core Components:	1 Year	Applicable Industries:	Other, Semiconductor

Place Of Origin:	Hunan, China
Type:	Induction Furnace
Usage:	Deposition Furnace
Video Outgoing-inspection:	Provided
Machinery Test Report:	Provided
Core Components:	PLC
Brand Name:	Jingtan
Voltage:	380
Weight (t):	2 T
Power (kw):	220
Key Selling Points:	Competitive Price
Design Temperature (℃):	1250-2200
Woring Temperature:	900-1200℃
Pressure Rise Rate (Pa/h):	0.67Pa/h(150Pa/24h)
Heating Method:	Resistance/induction
Working Atmosphere:	Vacuum/CH4/C3H6/H2/N2/Ar
Furnace Type:	Square/roundVertical/Horizontal
Furnace Cooling Mode:	Furnace Shell Water Cooling
Infrared Instrument:	Single/double Colorimetric
Temperature Uniformity:	±5
Limit Vacuum Degree(Pa):	1-100
Marketing Type:	Ordinary Product
Warranty Of Core Components:	1 Year
Applicable Industries:	Other, Semiconductor

Description

CVD Furnace Deposition Equipment for Semiconductor Material Preparation Thin Film

Specification:

Vacuum deposition furnace:

Mainly used for the preparation of carbon-carbon composite materials, and the deposition furnace is mainly used for the preparation of pyrolytic carbon coating on the surface of graphite, semiconductor devices and heat-resistant scour materials.

Parameter /Model No.	JT-0305-C	JT-0505-C	JT-0608-C	JT-0608-C	JT-0812-C	JT-1120-C	JT-1218-C	JT-1520-C
Working Zone Size φ×H(mm)	300×500	500×500	600×800	600×1200	800×1200	1100×2000	1200×1800	1500×2000
Highest Temperature (℃)	2300	2300	2300	2300	2300	2300	2300	2300
Temperature uniformity(℃)	±5	±5	±5/±7.5	±7.5/±10	±7.5/±10	±10/±15	±10/±15	±15/±20
Limit Vacuum Degree(Pa)	1-100	1-100	1-100	1-100	1-100	1-100	1-100	1-100
Limit Vacuum Degree(Pa)	0.67	0.67	0.67	0.67	0.67	0.67	0.67	0.67
Heating method	Resistance/induction	Resistance/induction	Resistance/induction	Resistance/induction	Resistance/induction	Resistance/induction	Resistance/induction	Resistance/induction

Design temperature	1250℃/1650℃/1800℃/2200℃
Common temperature	900~1200℃
Vacuum degree	< 50Pa
Pressure rise rate	6.67pA /h(or 150Pa/24h) in cold state of empty furnace
Heating mode	graphite resistance heating or induction heating, independent temperature control, good temperature uniformity
Atmosphere medium	vacuum /CH4/C3H6/H2/N2/Ar

Gas control mode	mass flow meter control, multi-channel gas path, uniform flow field, no deposition dead Angle, good deposition effect;Multi-stage and efficient exhaust treatment system, environmentally friendly, easy to clean up
Furnace type	square, round, vertical or horizontal structure (non-standard design), fully enclosed deposition chamber, good sealing effect, strong anti-pollution ability;
Furnace cooling mode	furnace shell water cooling, external circulation quick cooling system can be selected, short cooling time, high production efficiency;

Structure form	horizontal - side discharge, vertical - up/down discharge
Locking mode	manual/automatic
Shell material	inner stainless steel/all stainless steel
Insulation material	carbon felt/graphite felt/carbon fiber cured felt
Infrared instrument	single colorimetric/double colorimetric
Power supply	KGPS/IGBT(only suitable for medium frequency heating) Product parameter: